Pattern-Integrated Interference Lithography: Prospects for Nano- and Microelectronics

Pattern-integrated interference lithography instrumentation.

Multi-beam interference (MBI) provides the ability to form a wide range of sub-micron periodic optical-intensity distributions with applications to a variety of areas, including photonic crystals (PCs), nanoelectronics, biomedical structures, optical trapping, metamaterials, and numerous subwavelength structures. Recently, pattern-integrated interference lithography (PIIL) was presented as a ne...

Pattern-integrated interference lithography: single-exposure fabrication of photonic-crystal structures.

Multibeam interference represents an approach for producing one-, two-, and three-dimensional periodic optical-intensity distributions with submicrometer features and periodicities. Accordingly, interference lithography (IL) has been used in a wide variety of applications, typically requiring additional lithographic steps to modify the periodic interference pattern and create integrated functio...

Interference Lithography

Interference lithography (IL) is the preferred method for fabricating periodic and quasi-periodic patterns that must be spatially coherent over large areas. IL is a conceptually simple process where two coherent beams interfere to produce a standing wave, which can be recorded in a photoresist. The spatial-period of the grating can be as fine as half the wavelength of the interfering light, all...

Interference Lithography for Patterned Media

Low-cost interference lithography

The authors report demonstration of a low-cost 1000 USD interference lithography system based on a Lloyd’s mirror interferometer that is capable of 300 nm pitch patterning. The components include only a 405 nm GaN diode-laser module, a machinist’s block, a chrome-coated silicon mirror, substrate, and double-sided carbon scanning electron microscopy SEM tape. The laser and the machinist’s block ...